LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS

A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a me...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MEESTER Arnout Johannes, LANDHEER Siebe, TANASA Gheorghe, MIRANDA Marcio Alexandre Cano, THOMAS Ivo Adam Johannes
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.