SURFACE PASSIVATION OF HIGH-EFFICIENCY CRYSTALLINE SILICON SOLAR CELLS

Stable surface passivation on a crystalline silicon substrate is provided by forming a more heavily doped region as a front surface field and/or a doped dielectric layer under a passivation layer on the silicon substrate surface. A passivation layer is deposited on the front surface field and/or dop...

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Bibliographische Detailangaben
Hauptverfasser: Seutter Sean M, Moslehi Mehrdad M
Format: Patent
Sprache:eng
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Zusammenfassung:Stable surface passivation on a crystalline silicon substrate is provided by forming a more heavily doped region as a front surface field and/or a doped dielectric layer under a passivation layer on the silicon substrate surface. A passivation layer is deposited on the front surface field and/or doped dielectric layer.