HIGH-FREQUENCY POWER SUPPLY DEVICE

A high-frequency input voltage and a high-frequency input current to a series resonant circuit are detected by a voltage detection unit and a current detection unit, respectively, and plasma input power is detected by a plasma input power detection unit based on the detected high-frequency input vol...

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Bibliographische Detailangaben
1. Verfasser:	HABU Toshiya
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS COLORIMETRY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING PHYSICS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS RADIATION PYROMETRY TESTING
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Beschreibung
Zusammenfassung:	A high-frequency input voltage and a high-frequency input current to a series resonant circuit are detected by a voltage detection unit and a current detection unit, respectively, and plasma input power is detected by a plasma input power detection unit based on the detected high-frequency input voltage and high-frequency input current. By directly detecting the plasma input power in this manner, the plasma input power may be accurately controlled regardless of the state of a plasma-generating gas or an analysis sample. Also, use of a switching circuit including a semiconductor device allows an inexpensive configuration compared with a configuration where a vacuum tube or the like is used.