Thin Film Deposition Apparatus Having Plurality of Evaporation Sources

The present invention relates to a thin film deposition apparatus, which includes: a deposition chamber supporting a substrate therein; a plurality of crucibles keeping a deposition material to be deposited on the substrate; a distribution conduits coupled to the crucibles, respectively, and arrange...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Kim Jeong Taek, Kim Jong Jin, Lee Young Jong, Kim Myoung Soo
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention relates to a thin film deposition apparatus, which includes: a deposition chamber supporting a substrate therein; a plurality of crucibles keeping a deposition material to be deposited on the substrate; a distribution conduits coupled to the crucibles, respectively, and arranged in a line to spray an evaporated deposition material through a plurality of nozzles; a separator disposed between the distribution conduits for uniformity of a thin film deposited on the substrate and limiting a spray range of the evaporated deposition material; distribution conduit heaters independently installed and facing outer sides of the distribution conduits to heat the distribution conduits; crucible heaters heating the crucibles to evaporate the deposition material; and a top plate having an exit port corresponding to the nozzles and disposed over the distribution conduits.