PHOTOSENSITIVE REFRACTIVE INDEX-ADJUSTING TRANSFER FILM

By forming a refractive index-adjusting pattern by using a photosensitive refractive index-adjusting transfer film comprising a supporting film, a photosensitive resin layer provided on the supporting film, and a high-refractive index layer provided on the photosensitive resin layer, it is possible...

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Bibliographische Detailangaben
Hauptverfasser:	KIMURA Tadahiro, ABE Koji, MUKAI Ikuo, SATO Mayumi, TAKAHASHI Hideo, SASAHARA Naoki
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	By forming a refractive index-adjusting pattern by using a photosensitive refractive index-adjusting transfer film comprising a supporting film, a photosensitive resin layer provided on the supporting film, and a high-refractive index layer provided on the photosensitive resin layer, it is possible to form easily a cured film that can attain simultaneously prevention of pattern visibility phenomenon, prevention of lowering in transmittance of a screen and protection of a sensor metal wiring.