WAFER TRANSFER MICROCLIMATE TECHNIQUES AND APPARATUSES, INCLUDING HORIZONTAL SLOT IMPLEMENTATIONS AND/OR TRAVELLING SHOWERHEADS

Systems and techniques for forming buffer gas microclimates around semiconductor wafers in environments external to a semiconductor processing chamber are disclosed. Such systems may include slot doors that may allow for single wafers to be removed from a multi-wafer stack while limiting outflow of...

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Bibliographische Detailangaben
Hauptverfasser: Blank Richard M, van Gogh James Stephen, Witkowicki Derek John, Gould Richard Howard, Quiles Efrain, Salek Mohsen, Senn Brandon, Kristoffersen Candi, Singh Harmeet
Format: Patent
Sprache:eng
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Zusammenfassung:Systems and techniques for forming buffer gas microclimates around semiconductor wafers in environments external to a semiconductor processing chamber are disclosed. Such systems may include slot doors that may allow for single wafers to be removed from a multi-wafer stack while limiting outflow of buffer gas from a multi-wafer storage system, as well as buffer gas distributors that move in tandem with robot arms used to transport wafers for at least some of the movements of such robot arms.