LITHOGRAPHIC APPARATUS, METHOD OF TRANSFERRING A SUBSTRATE AND DEVICE MANUFACTURING METHOD

A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposu...

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Bibliographische Detailangaben
Hauptverfasser:	ALBERTI Jozef Augustinus Maria, VAN DER HAM Ronald, SEGERS Hubert Marie, FAHRNI Francis, OLIESLAGERS Ruud, VAN DONGEN Paul, WILLEMS Bas, PIETERSE Gerben, ROPS Cornelius Maria, VAN BEUZEKOM Aart Adrianus, VAN DEN EIJNDEN Pepijn
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.