MODULAR SYSTEM LAYOUT UTILIZING THREE-DIMENSIONS

A semiconductor processing system may be provided that includes a first plurality of semiconductor processing tools with a first average wafer transfer plane and a second plurality of semiconductor processing tools with a second average wafer transfer plane. The second plurality of semiconductor pro...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: van Gogh James Stephen, Gould Richard Howard, Salek Mohsen, Kristoffersen Candi
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A semiconductor processing system may be provided that includes a first plurality of semiconductor processing tools with a first average wafer transfer plane and a second plurality of semiconductor processing tools with a second average wafer transfer plane. The second plurality of semiconductor processing tools may be vertically offset from the first plurality of semiconductor processing tools by a first vertical distance measured between the first average wafer transfer plane and the second average wafer transfer plane, and the first and second pluralities of semiconductor processing tools are in a commonly shared space.