APPARATUS FOR PROCESSING OF A MATERIAL ON A SUBSTRATE AND METHOD FOR MEASURING OPTICAL PROPERTIES OF A MATERIAL PROCESSED ON A SUBSTRATE

According to one aspect of the present disclosure an apparatus for processing of a material on a substrate is provided. The apparatus includes a vacuum chamber and a measuring arrangement configured for measuring one or more optical properties of the substrate and/or the material processed on the su...

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Bibliographische Detailangaben
Hauptverfasser:	LOTZ Hans-Georg, SCHROEDER Jüergen
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING METALLURGY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TESTING
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Beschreibung
Zusammenfassung:	According to one aspect of the present disclosure an apparatus for processing of a material on a substrate is provided. The apparatus includes a vacuum chamber and a measuring arrangement configured for measuring one or more optical properties of the substrate and/or the material processed on the substrate, the measuring arrangement including at least one sphere structure located in the vacuum chamber.