ALIGNER STRUCTURE AND ALIGNMENT METHOD

An aligner structure comprises: a first alignment unit (100) for sequentially and firstly aligning the substrate (S) and the mask (M) by the first relative displacement between the substrate (S) and the mask (M); and a second alignment unit (200) for sequentially and secondarily aligning the substra...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	CHO Saeng Hyun
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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