ALIGNER STRUCTURE AND ALIGNMENT METHOD

An aligner structure comprises: a first alignment unit (100) for sequentially and firstly aligning the substrate (S) and the mask (M) by the first relative displacement between the substrate (S) and the mask (M); and a second alignment unit (200) for sequentially and secondarily aligning the substrate (S) and the mask (M) by the second relative displacement between the substrate (S) and the mask (M) after the first alignment by the first alignment unit (100). The displacement scale of the second relative displacement is smaller than the displacement scale of the first relative displacement so that the substrate (S) and the mask (M) can be quickly and precisely aligned by performing the first relative displacement between the substrate (S) and the mask (M) with a relatively small displacement scale after finishing the first relative displacement between the substrate (S) and the mask (M) with a relatively large displacement scale.