DEPOSITION MASK AND METHOD OF FABRICATING THE SAME

A method of fabricating a deposition mask, the method including forming a photoresist pattern on a base member, the photoresist pattern having a plurality of inversely tapered photo patterns and a photo opening defined by the photo patterns; forming a mask material layer in the photo opening and on...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: JEON Woo Seok, KAM Bum Soo, KANG Hoon, CHANG Chong Sup
Format: Patent
Sprache:eng
Schlagworte:
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