DEPOSITION MASK AND METHOD OF FABRICATING THE SAME

A method of fabricating a deposition mask, the method including forming a photoresist pattern on a base member, the photoresist pattern having a plurality of inversely tapered photo patterns and a photo opening defined by the photo patterns; forming a mask material layer in the photo opening and on...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	JEON Woo Seok, KAM Bum Soo, KANG Hoon, CHANG Chong Sup
Format:	Patent
Sprache:	eng
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS ELECTRICITY NOZZLES PERFORMING OPERATIONS SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A method of fabricating a deposition mask, the method including forming a photoresist pattern on a base member, the photoresist pattern having a plurality of inversely tapered photo patterns and a photo opening defined by the photo patterns; forming a mask material layer in the photo opening and on the photo patterns; removing the photo patterns and the mask material layer formed on the photo patterns, leaving the mask material layer formed in the photo opening; and removing the base member.