METHOD FOR REMOVING ALUMINUM FLUORIDE CONTAMINATION FROM SEMICONDUCTOR PROCESSING EQUIPMENT

METHOD FOR REMOVING ALUMINUM FLUORIDE CONTAMINATION FROM SEMICONDUCTOR PROCESSING EQUIPMENT

Embodiment disclosed herein generally relate to a method for removing aluminum fluoride contamination from semiconductor processing equipment. A method for cleaning semiconductor processing equipment is disclosed herein. The method includes maintaining a container of water at a temperature of betwee...

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Bibliographische Detailangaben
Hauptverfasser: WANG Jianqi, LO Sio On, PAPKE Kevin A, GOPALAN Ramesh, PAREEK Yogita
Format: Patent
Sprache:eng
Schlagworte:
CLEANING
CLEANING IN GENERAL
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
TRANSPORTING
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Beschreibung
Zusammenfassung:Embodiment disclosed herein generally relate to a method for removing aluminum fluoride contamination from semiconductor processing equipment. A method for cleaning semiconductor processing equipment is disclosed herein. The method includes maintaining a container of water at a temperature of between 50 degrees Celsius and 100 degrees Celsius and soaking a semiconductor processing equipment having surface contamination comprising aluminum fluoride in the water, wherein the semiconductor processing equipment is comprised of a material having a solubility directly related to the temperature of the water.