LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively...

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Bibliographische Detailangaben
Hauptverfasser:	DE GRAAF Roelof Frederik, DONDERS Sjoerd Nicolaas Lambertus, HOOGENDAM Christiaan Alexander, COX Henrikus Herman Marie, VERHAGEN Martinus Cornelis Maria, SMEULERS Johannes Petrus Maria, BELFROID Stefan Philip Christiaan, TEN KATE Nicolaas, Maria TEUNISSEN Franciscus Johannes Herman, VOGEL Herman, KEMPER Nicolaas Rudolf, VAN DER TOORN Jan-Gerard Cornelis, VAN DER MEULEN Frits, Maria MERTENS Jeroen Johannes Sophia
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.