METHODS OF THREE-DIMENSIONAL ELECTROPHORETIC DEPOSITION FOR CERAMIC AND CERMET APPLICATIONS AND SYSTEMS THEREOF

In one embodiment, a method for forming a ceramic, metal, or cermet includes: providing a first solution comprising a first solvent and a first material to a device including an electrophoretic deposition (EPD) chamber; applying a voltage difference across a first electrode and a second electrode of...

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Bibliographische Detailangaben
Hauptverfasser: Worsley Marcus, Kuntz Joshua D, Rose Klint Aaron
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:In one embodiment, a method for forming a ceramic, metal, or cermet includes: providing a first solution comprising a first solvent and a first material to a device including an electrophoretic deposition (EPD) chamber; applying a voltage difference across a first electrode and a second electrode of the device; electrophoretically depositing the first material above the first electrode to form a first layer; introducing a second solution including a second solvent and a second material to the EPD chamber; applying a voltage difference across the first electrode and the second electrode; and electrophoretically depositing the second material above the first electrode to form a second layer. The first layer has a first composition, a first microstructure, and a first density, while the second layer has a second composition, a second microstructure, and a second density. At least one of the foregoing features of the first and second layers are different.