SEMICONDUCTOR STRUCTURE AND METHOD FOR MAKING SAME

One or more embodiments relate to a method for making a semiconductor structure, comprising: providing a workpiece; forming a barrier layer over the workpiece; forming a separation layer over the barrier layer; forming a conductive layer over the separation layer; and wet etching the conductive laye...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Fischer Thomas, Stueckjuergen Andreas, Foerster Juergen, Robl Werner
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:One or more embodiments relate to a method for making a semiconductor structure, comprising: providing a workpiece; forming a barrier layer over the workpiece; forming a separation layer over the barrier layer; forming a conductive layer over the separation layer; and wet etching the conductive layer.