PHOTOVOLTAIC DEVICES WITH FINE-LINE METALLIZATION AND METHODS FOR MANUFACTURE

A method for use in forming a photovoltaic device includes forming a doped semiconductor layer on a surface of a semiconductor substrate and forming a metal film on the doped semiconductor layer. A patterned etched resist is formed on the metal film and the resist includes a plurality of finger port...

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Hauptverfasser: EGGLESTON Bonneville Dudgeon, TURNER Adrian Bruce
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method for use in forming a photovoltaic device includes forming a doped semiconductor layer on a surface of a semiconductor substrate and forming a metal film on the doped semiconductor layer. A patterned etched resist is formed on the metal film and the resist includes a plurality of finger portions and a plurality of bus bar portions aligned in a grid pattern. A metal film is etched to form a pattern of fingers and bus bars according to the resist.