MODELING APPARATUS AND MODELING METHOD

[Solving Means] A modeling apparatus includes a stage, an irradiation unit, a moving mechanism, and a stage-rotating mechanism. The irradiation unit selectively irradiates a region of a material supplied onto the stage, with an energy ray. The moving mechanism relatively moves, at least in a stackin...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: YASUKOCHI HIROYUKI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:[Solving Means] A modeling apparatus includes a stage, an irradiation unit, a moving mechanism, and a stage-rotating mechanism. The irradiation unit selectively irradiates a region of a material supplied onto the stage, with an energy ray. The moving mechanism relatively moves, at least in a stacking direction of the material, the stage and the irradiation unit. The stage-rotating mechanism rotates the stage.