ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS

The present invention relates to the composition of the organic layer, the organic layer composition comprises a substituted or unsubstituted fluorene structure of polymer, the additive represented by formula 1, and a solvent, wherein the organic layer by curing the composition to form the organic l...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	PARK You-Jung, KIM Min-Soo, RATHWELL Dominea, SONG Hyun-Ji, NAM Youn-Hee, YANG Sun young, KANG Sun-Hae
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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Beschreibung
Zusammenfassung:	The present invention relates to the composition of the organic layer, the organic layer composition comprises a substituted or unsubstituted fluorene structure of polymer, the additive represented by formula 1, and a solvent, wherein the organic layer by curing the composition to form the organic layer.; and using the organic layer composition, a method of forming a pattern. The organic layer composition can improve gap-fill characteristics and planarization characteristics and etch resistance in chemical formula 1, the definition of each symbol is the same as defined in the embodiments. (img file = 'DDA 0000874755860000011. TIF 'wi = '407 'he = '268').