ULTRAVIOLET ACTIVATED ANTIMICROBIAL SURFACES

The invention is directed to an ion plasma deposition (IPD) method adapted to coat polymer surfaces with highly adherent antimicrobial films. A controlled ion plasma deposition (IPD) process is used to coat a metal or polymer with a selected metal/metal oxide. Exposing the coated surface to ultravio...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: STOREY DANIEL M, SEWELL DEIDRE, MCGRATH TERRENCE S
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The invention is directed to an ion plasma deposition (IPD) method adapted to coat polymer surfaces with highly adherent antimicrobial films. A controlled ion plasma deposition (IPD) process is used to coat a metal or polymer with a selected metal/metal oxide. Exposing the coated surface to ultraviolet light significantly improves the antimicrobial properties of the deposited coatings.