SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME

An object of the invention is to provide a semiconductor device having less cracking or peeling and a method of manufacturing the same. A fuse portion of a semiconductor device has bit lines electrically coupled to a SRAM memory cell. The bit lines are covered by an interlayer insulating film. As the interlayer insulating film, a boron-doped BPTEOS film is formed. The bit lines have thereabove a fuse. The fuse and the bit lines are electrically coupled to each other via contact plugs. The interlayer insulating film that covers the bit lines therewith is separated from the contact plugs.