Systems and Methods for Enhancing Inspection Sensitivity of an Inspection Tool

Systems and methods for enhancing inspection sensitivity to detect defects in wafers using an inspection tool are disclosed. A plurality of light emitting diodes illuminate at least a portion of a wafer and capture a set of grayscale images. A residual signal is determined in each image of the grays...

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Bibliographische Detailangaben
Hauptverfasser:	Wen Youxian, Aji Prashant, Schwitalla Sven, Li Shifang, Nicolaides Lena
Format:	Patent
Sprache:	eng
Schlagworte:	CALCULATING COMPUTING COUNTING ELECTRIC COMMUNICATION TECHNIQUE ELECTRICITY HANDLING RECORD CARRIERS IMAGE DATA PROCESSING OR GENERATION, IN GENERAL PHYSICS PICTORIAL COMMUNICATION, e.g. TELEVISION PRESENTATION OF DATA RECOGNITION OF DATA RECORD CARRIERS
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Beschreibung
Zusammenfassung:	Systems and methods for enhancing inspection sensitivity to detect defects in wafers using an inspection tool are disclosed. A plurality of light emitting diodes illuminate at least a portion of a wafer and capture a set of grayscale images. A residual signal is determined in each image of the grayscale image set and the residual signal is subtracted from each image of the grayscale image set. Defects are identified based on the subtracted grayscale image set. Models of the inspection tool and wafer may be built and refined in some embodiments of the disclosed systems and methods.