PATTERN INSPECTION APPARATUS AND PATTERN INSPECTION METHOD

A pattern inspection apparatus according to an embodiment includes an image capture and an output part. The image capture captures an image of a second pattern of an inspection target object obtained by enlarging the inspection target object having a first pattern. The output part outputs position i...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Yoshikawa Ryoji, Morita Seiji, Hirano Takashi, Higashiki Tatsuhiko
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A pattern inspection apparatus according to an embodiment includes an image capture and an output part. The image capture captures an image of a second pattern of an inspection target object obtained by enlarging the inspection target object having a first pattern. The output part outputs position information of the first or second pattern corresponding to divergent portions between a reference data generated from design data of the first pattern and a captured data generated by the image capture, other than prediction positions of first defects occurring when the inspection target object is enlarged.