DETERMINING THREE-DIMENSIONAL INFORMATION FROM PROJECTIONS OR PLACEMENT OF TWO-DIMENSIONAL PATTERNS

Embodiments of a shape measurement system and related methods are disclosed. In some embodiments, the system places a two-dimensional initial pattern, which can be implemented as a standalone molding or can be attached to a light source or printed on an outfit, onto a surface of a three-dimensional...

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Bibliographische Detailangaben
Hauptverfasser: Rapoport Jacob, Rohatgi Amit, Orner William D, Bismuth Robert
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Embodiments of a shape measurement system and related methods are disclosed. In some embodiments, the system places a two-dimensional initial pattern, which can be implemented as a standalone molding or can be attached to a light source or printed on an outfit, onto a surface of a three-dimensional object. The system captures a transformed version of the initial pattern in two dimensions that is distorted due to the varying depth of the surface. The system then analyzes the transformed pattern and derives three-dimensional information regarding the target object. The analysis, which can incorporate a calibration process, can rely on the projection nature of the light source, the isomorphism/non-isomorphism of the initial pattern, and other factors.