SUBSTRATE PRETREATMENT METHOD AND APPARATUS

The present invention provides a substrate pretreatment method and apparatus. The method includes the steps of: step 1, providing a substrate waiting for a pretreatment, an UV chamber and a loading chamber; step 2, providing a transfer chamber between the UV chamber and the loading chamber to connec...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ZOU Qinghua, WU Tsungyuan
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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