SUBSTRATE PRETREATMENT METHOD AND APPARATUS

The present invention provides a substrate pretreatment method and apparatus. The method includes the steps of: step 1, providing a substrate waiting for a pretreatment, an UV chamber and a loading chamber; step 2, providing a transfer chamber between the UV chamber and the loading chamber to connect the UV chamber and the loading chamber, providing a first sealing door at a place where the UV chamber and the transfer chamber are connected with each other, and providing a second sealing door at a place where the transfer chamber and the loading chamber are connected with each other; step 3, putting the substrate waiting for the pretreatment into the UV chamber; step 4, closing the UV chamber and sending dried oxygen into the UV chamber for performing an UV treatment; step 5, opening the first sealing door and transferring the substrate into the transfer chamber after the UV treatment being completed; step 6, closing the first sealing door, opening the second sealing door and transferring the substrate into the loading chamber after the substrate being completely transferred into the transfer chamber; step 7, closing the second sealing door and evacuating the loading chamber after the substrate being completely transferred into the loading chamber.