SUBSTRATE DETACHING APPARATUS
The present invention aims at reducing a breaking phenomenon of an adsorbed substrate while the substrate is detached from a lower plate at a high speed. An embodiment is a substrate detaching apparatus including an adsorption main body disposed on one side of the adsorbed substrate to generate an a...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | The present invention aims at reducing a breaking phenomenon of an adsorbed substrate while the substrate is detached from a lower plate at a high speed. An embodiment is a substrate detaching apparatus including an adsorption main body disposed on one side of the adsorbed substrate to generate an adsorption force; and a plurality of adsorption parts provided in a predetermined adsorption region of the substrate under the adsorption main body, being spaced apart from each other and applied with an adsorption force from the adsorption main body to adsorb the substrate, wherein the adsorption region includes an outer region of a first cycloid curved line protruding in a third corner direction based on a diagonal connecting between a first corner and a second corner of the adsorbed substrate and an outer region of a second cycloid curved line protruding in a fourth corner direction. |
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