CLEANING APPARATUS FOR SEMICONDUCTOR EQUIPMENT

A cleaning apparatus for a semiconductor equipment is provided. The cleaning apparatus comprising a cleaning pad with a plurality of brushes thereon is located on a rotor of the semiconductor equipment to remove residues within the semiconductor equipment by using the brushes against the residues vi...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: HAN Tsung-Hsun, Huang Tsan-Hua, HUANG Chien-Ping, WONG Kian-Poh
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A cleaning apparatus for a semiconductor equipment is provided. The cleaning apparatus comprising a cleaning pad with a plurality of brushes thereon is located on a rotor of the semiconductor equipment to remove residues within the semiconductor equipment by using the brushes against the residues via moving and rotating the rotor and the cleaning apparatus.