DEPOSITING APPARATUS

A deposition apparatus includes: a deposition source disposed facing a substrate and configured to accommodate a deposition material; and a plurality of injection nozzles arranged from one side of the deposition source along a first direction, the plurality of injection nozzles configured to inject...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: CHOI HYUN, JEONG SEONG HO, LEE BYUNG CHUL, PARK GAN YOUNG, LEE CHANG SIK
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A deposition apparatus includes: a deposition source disposed facing a substrate and configured to accommodate a deposition material; and a plurality of injection nozzles arranged from one side of the deposition source along a first direction, the plurality of injection nozzles configured to inject the deposition material onto the substrate, each injection nozzle including: a first injection part including a first injection passage which has one end connected to the deposition source and extends along a second direction between the deposition source and the substrate, and a second injection part including a second injection passage which has walls extending from the other end of the first injection passage in a direction inclined at a predetermined inclined angle with respect to the second direction, wherein the first direction is a length direction of the deposition source and the second direction is a height direction of the deposition source.