SHALLOW TRENCH ISOLATIONS AND METHOD OF MANUFACTURING THE SAME
A method of manufacturing shallow trench isolations is provided in the present invention, which includes the steps of providing a substrate, performing a zero etch to form preliminary trenches in the substrate, performing a STI etch to the preliminary trenches to form final trenches, where the final...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A method of manufacturing shallow trench isolations is provided in the present invention, which includes the steps of providing a substrate, performing a zero etch to form preliminary trenches in the substrate, performing a STI etch to the preliminary trenches to form final trenches, where the final trenches are deeper and steeper than the preliminary trenches, and filling up the final trenches with insulating material to form shallow trench isolations. |
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