PROCESS FOR MANUFACTURING A MICROSTRUCTURED COATING, AND WALL HAVING SUCH A COATING

This relates to a process for manufacturing a microstructured coating on a substrate, which comprises a step of spraying molten particles having a diameter comprised between 0.05 μm and 5 μm onto the substrate, the spraying being carried out by at least one plasma torch, which is moved relative to t...

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Bibliographische Detailangaben
Hauptverfasser:	SURPLY THIERRY, RIVES BERTRAND, PORTE ALAIN
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	This relates to a process for manufacturing a microstructured coating on a substrate, which comprises a step of spraying molten particles having a diameter comprised between 0.05 μm and 5 μm onto the substrate, the spraying being carried out by at least one plasma torch, which is moved relative to the substrate, the movement parameters and/or the flowrate of particles sprayed by the plasma torches being variable as a function of the position of the plasma torches, ensuring a variable thickness for the coating formed by the particles, at various points of the substrate. The embodiment also relates to a wall having a coating obtained by this process.