LITHOGRAPHY PROCESS WINDOW PREDICTION BASED ON DESIGN DATA
A method of manufacturing a semiconductor device, comprising providing design data, producing lithography masks based on the design data, predicting a product process window and producing a wafer including semiconductor structures by means of the lithography masks and observing conditions defined by...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A method of manufacturing a semiconductor device, comprising providing design data, producing lithography masks based on the design data, predicting a product process window and producing a wafer including semiconductor structures by means of the lithography masks and observing conditions defined by the product process window. |
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