METHOD OF FORMING KEY PATTERNS AND METHOD OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME

METHOD OF FORMING KEY PATTERNS AND METHOD OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME

Provided are a method of forming key patterns and a method of fabricating a semiconductor device using the same. The method of forming key patterns may include forming gate and key patterns on a cell region and a scribe lane region, respectively. Here, the key patterns may be formed to have a large...

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Bibliographische Detailangaben
Hauptverfasser: LEE HYUNCHANG, JUNG RANKYUNG, HAM BOO-HYUN, BAE YONGKUG, KOO JA-MIN, BAEK JONGHWA, SHIN HEEJU
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:Provided are a method of forming key patterns and a method of fabricating a semiconductor device using the same. The method of forming key patterns may include forming gate and key patterns on a cell region and a scribe lane region, respectively. Here, the key patterns may be formed to have a large width and a larger pitch than those of the gate patterns.