LITHOGRAPHIC METHOD

A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the powe...

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Hauptverfasser:	KRUIZINGA BORGERT, DE VRIES GOSSE CHARLES, ENGELEN WOUTER JOEP, DE JAGER PIETER WILLEM HERMAN, GRIMMINCK LEONARDUS ADRIANUS GERARDUS, AKKERMANS JOHANNES ANTONIUS GERARDUS, LOOPSTRA ERIK ROELOF, BANINE VADIM YEVGENYEVICH, LITVINENKO VLADIMIR, LUITEN OTGER JAN, NIKIPELOV ANDREY ALEXANDROVICH, DONKER RILPHO LUDOVICUS, NIENHUYS HAN-KWANG, FRIJNS OLAV WALDEMAR VLADIMIR
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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