LITHOGRAPHIC METHOD

A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the powe...

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Hauptverfasser:	KRUIZINGA BORGERT, DE VRIES GOSSE CHARLES, ENGELEN WOUTER JOEP, DE JAGER PIETER WILLEM HERMAN, GRIMMINCK LEONARDUS ADRIANUS GERARDUS, AKKERMANS JOHANNES ANTONIUS GERARDUS, LOOPSTRA ERIK ROELOF, BANINE VADIM YEVGENYEVICH, LITVINENKO VLADIMIR, LUITEN OTGER JAN, NIKIPELOV ANDREY ALEXANDROVICH, DONKER RILPHO LUDOVICUS, NIENHUYS HAN-KWANG, FRIJNS OLAV WALDEMAR VLADIMIR
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.