ENDPOINTING FOR FOCUSED ION BEAM PROCESSING

ENDPOINTING FOR FOCUSED ION BEAM PROCESSING

To expose a desired feature, focused ion beam milling of thin slices from a cross section alternate with forming a scanning electron image of each newly exposed cross section. Milling is stopped when automatic analysis of an electron beam image of the newly exposed cross section shows that a pre-det...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: FULLER SCOTT EDWARD, SEEMUNTCHAIBOWORN TERMSUPT, DONALD JASON
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Beschreibung
Zusammenfassung:To expose a desired feature, focused ion beam milling of thin slices from a cross section alternate with forming a scanning electron image of each newly exposed cross section. Milling is stopped when automatic analysis of an electron beam image of the newly exposed cross section shows that a pre-determined criterion is met.