COMPOUND, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

Provided is an active light sensitive or radiation sensitive resin composition which contains a compound (A) represented by General Formula (I) or (II): in the formulae, each of Y1 and Y2 represents a monovalent organic group; each of M1+ and M2+ represents an organic onium ion; each of X1 and X2 re...

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Bibliographische Detailangaben
1. Verfasser:	TSUCHIMURA TOMOTAKA
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES STEROIDS
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Beschreibung
Zusammenfassung:	Provided is an active light sensitive or radiation sensitive resin composition which contains a compound (A) represented by General Formula (I) or (II): in the formulae, each of Y1 and Y2 represents a monovalent organic group; each of M1+ and M2+ represents an organic onium ion; each of X1 and X2 represents a group that is represented by -S-, -NH-, or -NR1-; R1 represents a monovalent organic group; each of n1 and n2 represents an integer of 1 or more; and R1 and Y1 or Y2 may bond with each other to form a ring.