STRUCTURE AND METHOD FOR TRANSIENT VOLTAGE SUPPRESSION DEVICES WITH A TWO-REGION BASE
A transient voltage suppression (TVS) device and a method of forming the device are provided. The TVS device includes a first layer of wide band-gap semiconductor material formed of a first conductivity type material, a second layer of wide band-gap semiconductor material formed of a second conducti...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A transient voltage suppression (TVS) device and a method of forming the device are provided. The TVS device includes a first layer of wide band-gap semiconductor material formed of a first conductivity type material, a second layer of wide band-gap semiconductor material formed of a second conductivity type material over at least a portion of the first layer, the second layer including a first concentration of dopant. The TVS device further including a third layer of wide band-gap semiconductor material formed of the second conductivity type material over at least a portion of the second layer, the third layer including a second concentration of dopant, the second concentration of dopant being different than the first concentration of dopant. The TVS device further including a fourth layer of wide band-gap semiconductor material formed of the first conductivity type material over at least a portion of the third layer. |
---|