SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME

One semiconductor device includes a capacitor having a lower electrode which is arranged on a semiconductor substrate, a second protective film, a dielectric film which has a defect that extends in the film thickness direction from an upper surface that faces the second protective film, a third prot...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: HIROTA TOSHIYUKI, MATSUI TAKAKAZU
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:One semiconductor device includes a capacitor having a lower electrode which is arranged on a semiconductor substrate, a second protective film, a dielectric film which has a defect that extends in the film thickness direction from an upper surface that faces the second protective film, a third protective film which has at least a defect filling film that is formed of an insulating body filling the defect, a first protective film which covers the dielectric film and the third protective film, and an upper electrode which covers the first protective film.