METHOD AND SYSTEM FOR SUPPLYING A CLEANING GAS INTO A PROCESS CHAMBER

A method and apparatus for cleaning a process chamber are provided. In one embodiment, a process chamber is provided that includes a remote plasma source and a process chamber having at least two processing regions. Each processing region includes a substrate support assembly disposed in the process...

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Bibliographische Detailangaben
Hauptverfasser:	NOWAK THOMAS, M'SAAD HI, DU BOIS DALE R, SANKARAKRISHNAN RAMPRAKASH, BALASUBRAMANIAN GANESH, JANAKIRAMAN KARTHIK, ROCHA-ALVAREZ JUAN CARLOS, SIVARAMAKRISHNAN VISWESWAREN
Format:	Patent
Sprache:	eng
Schlagworte:	ACTUATING-FLOATS BLASTING COCKS DEVICES FOR VENTING OR AERATING ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING LIGHTING MECHANICAL ENGINEERING TAPS THERMAL INSULATION IN GENERAL VALVES WEAPONS
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Beschreibung
Zusammenfassung:	A method and apparatus for cleaning a process chamber are provided. In one embodiment, a process chamber is provided that includes a remote plasma source and a process chamber having at least two processing regions. Each processing region includes a substrate support assembly disposed in the processing region, a gas distribution system configured to provide gas into the processing region above the substrate support assembly, and a gas passage configured to provide gas into the processing region below the substrate support assembly. A first gas conduit is configured to flow a cleaning agent from the remote plasma source through the gas distribution assembly in each processing region while a second gas conduit is configured to divert a portion of the cleaning agent from the first gas conduit to the gas passage of each processing region.