SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND SEMICONDUCTOR DEVICE

A substrate includes a base substrate including a processed portion processed by irradiation with an ultrashort-pulse laser light and an unprocessed portion which is not irradiated with the ultrashort-pulse laser light, the processed portion and the unprocessed portion are on a surface of the base s...

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Bibliographische Detailangaben
1. Verfasser:	TANIGAWA TATSUYA
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A substrate includes a base substrate including a processed portion processed by irradiation with an ultrashort-pulse laser light and an unprocessed portion which is not irradiated with the ultrashort-pulse laser light, the processed portion and the unprocessed portion are on a surface of the base substrate, and a semiconductor crystal layer crystal-grown at least on the unprocessed portion of the base substrate.