Constructions Comprising Rutile-Type Titanium Oxide; And Methods of Forming And Utilizing Rutile-Type Titanium Oxide

Some embodiments include methods of forming rutile-type titanium oxide. A monolayer of titanium nitride may be formed. The monolayer of titanium nitride may then be oxidized at a temperature less than or equal to about 550° C. to convert it into a monolayer of rutile-type titanium oxide. Some embodi...

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Hauptverfasser: HUANG TSAI-YU, MIRIN NIK, BHAT VISHWANATH, CARLSON CHRIS M, ANTONOV VASSIL N
Format: Patent
Sprache:eng
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Zusammenfassung:Some embodiments include methods of forming rutile-type titanium oxide. A monolayer of titanium nitride may be formed. The monolayer of titanium nitride may then be oxidized at a temperature less than or equal to about 550° C. to convert it into a monolayer of rutile-type titanium oxide. Some embodiments include methods of forming capacitors that have rutile-type titanium oxide dielectric, and that have at least one electrode comprising titanium nitride. Some embodiments include thermally conductive stacks that contain titanium nitride and rutile-type titanium oxide, and some embodiments include methods of forming such stacks.