SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

A substrate processing apparatus includes a mounting unit on which a substrate is mounted, a light generation and detection unit that forms an optical path parallel to a surface of the substrate at a location separated from the surface of the substrate by a predetermined distance and is capable of d...

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Bibliographische Detailangaben
1. Verfasser: YAMADA NOBUHIDE
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
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Beschreibung
Zusammenfassung:A substrate processing apparatus includes a mounting unit on which a substrate is mounted, a light generation and detection unit that forms an optical path parallel to a surface of the substrate at a location separated from the surface of the substrate by a predetermined distance and is capable of detecting shielding of the optical path, and a control unit that controls movement of at least one of the mounting unit and the optical path to control relative movement between the optical path and the substrate in a state where parallelism between the optical path and the surface of the substrate is maintained.