EXPOSURE MANAGEMENT SYSTEM

An exposure management system according to an embodiment includes a processing circuitry. The processing circuitry is configured to calculate a deviation index related to a difference between a target exposure index indicating an index of an exposure value that is set as a target of an X-ray image t...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: NAGAI SEIICHIROU, KOTANI ATSUSHI, SUGAWARA YASUHIRO, YASHIRO SHOJI, ICHIKAWA TSUTOMU, OOHASHI TOSHIKATSU
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:An exposure management system according to an embodiment includes a processing circuitry. The processing circuitry is configured to calculate a deviation index related to a difference between a target exposure index indicating an index of an exposure value that is set as a target of an X-ray image taking process and an image-taking-period exposure index indicating an index of an exposure value observed during the X-ray image taking process. The processing circuitry is configured to control so as to cause a display device to display history information from a predetermined time period indicating at least one selected from between image-taking-period exposure indices and deviation indices.