SEMICONDUCTOR DEVICE INCLUDING A VERTICAL GATE-ALL-AROUND TRANSISTOR AND A PLANAR TRANSISTOR
A semiconductor device includes a first transistor and a second transistor. Each of the first and second transistors includes a channel. The channel of the first transistor extends in a substantially vertical direction. The channel of the second transistor extends in a substantially horizontal direc...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | A semiconductor device includes a first transistor and a second transistor. Each of the first and second transistors includes a channel. The channel of the first transistor extends in a substantially vertical direction. The channel of the second transistor extends in a substantially horizontal direction. A method for fabricating the semiconductor device is also disclosed. |
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