WAFER CHUCK

A wafer chuck is provided. The wafer chuck includes a main body and a dielectric layer disposed over the main body. The wafer chuck also includes an electrode embedded in the dielectric layer and configured to generate an electrostatic field for retaining a wafer. The wafer chuck further includes a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: WANG YEHIEH, PAI JIUN-RONG, LEE CHENG-LUNG, LIU HSU-SHUI, LIOU KUANGUNG
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A wafer chuck is provided. The wafer chuck includes a main body and a dielectric layer disposed over the main body. The wafer chuck also includes an electrode embedded in the dielectric layer and configured to generate an electrostatic field for retaining a wafer. The wafer chuck further includes a thermal conductive layer embedded in the main body or the dielectric layer. The thermal conductive layer has a lateral thermal conductivity greater than a vertical thermal conductivity.