NITRIDE SEMICONDUCTOR DIODE

To provide a nitride semiconductor diode that includes conductive layers formed with a two-dimensional electron gas and achieves low on-state resistance characteristics, a high withstand voltage, and low reverse leakage current characteristics, each of the AlGaN layers and the GaN layers in a nitrid...

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Bibliographische Detailangaben
Hauptverfasser: TERANO AKIHISA, OHTOSHI TSUKURU, TSUCHIYA TOMONOBU
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:To provide a nitride semiconductor diode that includes conductive layers formed with a two-dimensional electron gas and achieves low on-state resistance characteristics, a high withstand voltage, and low reverse leakage current characteristics, each of the AlGaN layers and the GaN layers in a nitride semiconductor diode including conductive layers of a two-dimensional electron gas that are formed when the AlGaN layers and the GaN layers are alternately stacked has a double-layer structure formed with an undoped layer (upper layer) and an n-type layer (lower layer).