FLUORINE-MODIFICATION PROCESS AND APPLICATIONS THEREOF

The present invention is related to a process for reducing surface energy of a hole transport layer. The disclosed process comprises providing a hole transport layer; and providing a fluorine-containing layer directly on said hole transport layer. The configuration of said fluorine-containing layer...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: CHEN KUEI-HSIEN, DU CHAN-YI, HAN HSIEHNG, CHANG CHINGUN, CHEN LIYONG
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention is related to a process for reducing surface energy of a hole transport layer. The disclosed process comprises providing a hole transport layer; and providing a fluorine-containing layer directly on said hole transport layer. The configuration of said fluorine-containing layer reduces the structural disorder of an active layer and is able to recover a moisture-degraded hole transport layer, and thereby improves the performance of an electric device containing the same.