Patterning Methods and Methods of Making a Photoresist Composition Using a Photoresist Additive

Methods of forming a semiconductor device using a photoresist additive and methods of making a photoresist composition using the photoresist additive are disclosed. The photosensitive additive includes a polymer; at least one photo-acid generator (PAG); and at least one additive compound comprising...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	CHEN CHIENIH
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	Methods of forming a semiconductor device using a photoresist additive and methods of making a photoresist composition using the photoresist additive are disclosed. The photosensitive additive includes a polymer; at least one photo-acid generator (PAG); and at least one additive compound comprising a base and an acid-labile group (ALG). The at least one additive compound undergoes intramolecular cyclization to from a cyclic amide compound in the presence of acid. The at least one additive compound also neutralizes acid generated by the PAG without consuming the acid and does not absorb much light in the exposure areas.